Samsung Electronics has announced a new generation of lithography technology roadmap, which will deploy high-NA EUV in volume production at the 1nm node.

August 11, Samsung Electronics technical expert Park Chang-min announced at the 2026 NGL Conference that Samsung Electronics plans to introduce a major innovation of using photolithography in its 1-nanometer process, which could potentially be first mass-produced in 2030. The company intends to deploy High NA EUV in mass production at the 1nm node, which is a next-generation extreme ultraviolet lithography technology currently focused on developing the technology required for commercialization.

In addition, Samsung Electronics is also enhancing the development of High NA EUV, which is the next generation of EUV technology. The company has set the 1nm (or A10) process as its target for full-scale deployment in mass production. 「A」 refers to angstrom, where 1 angstrom is equal to 0.1nm.